非致冷紅外探測器用VO-,x-薄膜的制備與性能研究.pdf

1、合肥工業(yè)大學(xué)碩士學(xué)位論文非致冷紅外探測器用VO薄膜的制備與性能研究姓名：方廣志申請學(xué)位級別：碩士專業(yè)：材料學(xué)指導(dǎo)教師：李合琴20090301PreparationsandPropertiesofVOxThinFilmsforUncooledInfraredDetectorAbstractV0xthinfilmsiSainfraredthermosensitivesemiconductormaterialAsaspecialfunctio

2、nmaterial，vanadiumdioxide(V02)hasattractedgreatinterestandbeenextensivelystudiedV02undergoesasemiconductormetalphasetransitionapproximatelyat68。Cwhichisnearroom—temperatureThetransitionisaccompaniedwithanabruptchangeinit

3、selectrical，magneticsusceptibilitythermalcapacitanceandopticalpropertiesItCanbewidelyusedinuncooledinfrareddetector，thermalchomicswitches，photoelectricswitches，opticalstorageandSOonInchapterl，thecrystallinestructure，prop

4、erties，allkindsofpreparingmethodsandthepotentialapplicationsaboutVOxthinfilmsareintroducedInchapter2，wesystematicallyintroducethetheoryandprocessofradiofrequency(RF)magnetronsputteringandionbeamdepositionsputtering(IBD)T

5、hepreparationsofVOxthinfilmareintroducedindetailFinally，wesummarizethecharacterizationtechniquesusedinourexperimentsInchapter3，westudytheRFmagnetronsputteringprocessofVOxthinfilms，atthesametimetheinfluencesof02／Arflowrat

6、io，workingpressure，substrate，sputteringtimeandannealtemperatureontheelectricalresistancemutationareinducedThescanningelectronmicroscope(SEM)，X—raydiffraction(XRD)，Xrayphotoelectronspectroscopy(xes)ofOz／Arflowratiosanddif

7、ferentsubstratesarestudiedinV0xfilmsTheresultsshowthattheVOxthinfilmwiththe02／Arratioof05：50，thesputteringpowerof120Wtheworkingpressureof15PahasagoodqualitycrystallinestructureThethinrimisannealedinvaccum111emoreisconten

8、tofV02phaseandlargeranabruptresistancechangeisThethinflimsonSisubstratesarebetterthantherimsonglassesInchapter4，westudytheDCandRFmagnetronsputteringprocessofVOx／TiOxthinfilmsandVOx／TiOx／TimultilayerthinrimsTheresultsshow

9、thatthebufferoftitaniumoxideortitaniumthinfilms，arebenefittothecrystallinequalityofvanadiumoxidethinfilmsThestressbetweentheglasssubstrateandthevanadiumoxidethinfilmsisreducedInchapter5，westudytheinternalfrictionofVOx／Ti