電子信息工程專業(yè)導(dǎo)論論文

1、2本科畢業(yè)設(shè)計(jì)（論文）題目正弦波紋形貌金屬表面二次電子發(fā)射特性的數(shù)值仿真研究Sinecrugatedmetalsurfacesecondaryelectronemissionacteristicofthenumericalsimulationresearch作者姓名李玉專業(yè)名稱電子信息工程學(xué)科門類理學(xué)指導(dǎo)老師柳鈺提交論文日期二〇一四年五月成績(jī)等級(jí)評(píng)定2AbstractThephenomenonofsecondaryelectronemi

2、ssion(SEE)frommetalunderelectronbombardmenthasimptantvalueintheapplicationofmanymodernelectronicdevices.SEEacteristicsareaffectedbytheinteractionbetweensecondaryelectrons(SEs)surfaceswithcomplextopography.Howevertheresti

3、lllacksanaccuratereliablenumericalsimulationanalysisftheSEEfromthecomplexsurfacesaswellastheknowledgeoftherelatedmicroscopicmechanism.Thispaperestablishedacomprehensiveconsiderationinmetalelectronscatteringsecondaryelect

4、ronexcitationelectronicmigrationtothesurfacetoescapefromthesurfacetheinteractionbetweenelectronroughsurfacemanytimessuchasnumericalcalculationmodelofprocessonthebasisofthismodelbasedonsinecrugatedroughsurfacethesecondary

5、electronemissionyieldofmetalmaterialenergyAngledistributionwiththeruleofsurfacetopographyparametersaresimulatedanalysis.Calculationshowedthatthesinusoidalsurfaceofsecondaryelectronemissionyieldincreaseswithhalfwideamplit

6、uderatioisincreasedafterthefirstdecreasesthetopyieldclosetoidealplanefromtheentrance.Alsofoundthatthecomplexsurfacetopographyinfluenceonsecondaryelectricquantumyieldincreasesthatmayinhibittwooppositeeffectstheneedtocontr

7、olintheprocessofmachiningsurfacemphologystructureparameterstoachievethesecondaryelectricquantumyieldtoenhanceinhibitrequirementsenhanceinhibitthesecondaryelectronemissionfitsschemeprovidesaguidingcriterion.Finallythiswko

8、btainedresultsarehelpfulfthefurtherSEEstudyofcomplicatedmetalsurfacescrespondingmicroscopicmechanismstherefecanbereferredfpracticalefftsofSEYsuppression.Keywds:Secondaryelectronemission；Metal；Roughsurfacemphology；Numeric