二元光學(xué)元件的激光直寫及光刻技術(shù)的研究.pdf

1、浙江大學(xué)碩士學(xué)位論文二元光學(xué)元件的激光直寫及光刻技術(shù)的研究姓名：吳劍申請學(xué)位級(jí)別：碩士專業(yè)：光學(xué)工程指導(dǎo)教師：沈亦兵2001.3.1浙江大學(xué)碩士學(xué)位論文AbstractThedevelopmentofbinaryopticsandthemainmethodsusedformanufabricationareintroducedinthisthesisParticularlythetechniquesoflaserdirectwritin

2、gandphotolithographyareanalyzedindetailLaserdirectwritingisanovelfabricationmethodforbinaryopticalcomponentsThecontrolforlaserintensityinthelaserdirectwritingsystem(LOWS)ismainlydiscussedinthethesisFortheresponsedelayofa

3、cousto—opticmodulator(AOM)，themeasuresofsettingaelectricshutteronthelightpathanddesigningsuitablecontrollogicarecompletedtokeeptheAOM’SdelaytimeoutoftheexposureprocessThefabricationerrorsarethusavoidedtoobtmnphotolithogr

4、aphi。paRernswithgoodqualityPhotolithographyaconventionalmethodforthefabricationofbinaryopticalparts，possessesthereliabilityandhighprecisionInthethesis，theprocedureforthedesignofphotomasksisexplainedindetail，andtheprocess

5、esofphotoresist—coating，exposureanddevelopmentarealsodiscussedTheeffectsofvariousprocessparametersonthequalityofphotolithographicpatternsarestudiedIntheanalysisresults，somecontrolstrategiesareputforwardReactiveionbeametc

6、hing(RⅢE)isakeytechniqueforthetransferoftheprofileofbinaryopticalcomponentsTheeffectsofvariousparametersonthecomponents’mouldingarestudiedThecontrolmethodofetchingrateofSisubstrateiSmainlydiscussedandmeasuresthatcombinet

7、hemereionetchingandreactiveionetchingarepresentedfortheexactcontroloftheetchingdepthInaddition，themodificationforerrorsofetchingdepthisexploredThethesisalsointroducessomeresearchonverticalerrorsandlateralerrorsinvolvedin